CMOS Stocks List
Symbol | Grade | Name | % Change | |
---|---|---|---|---|
ON | D | ON Semiconductor Corporation | -0.33 | |
DIOD | D | Diodes Incorporated | 0.75 | |
MU | C | Micron Technology, Inc. | 3.19 | |
TSEM | B | Tower Semiconductor Ltd. | 0.30 | |
LRCX | A | Lam Research Corporation | 0.92 |
Related Industries: Semiconductor Equipment & Materials Semiconductor Memory Semiconductors
Symbol | Grade | Name | Weight | |
---|---|---|---|---|
SEMI | B | Columbia Seligman Semiconductor and Technology ETF | 13.84 | |
SOXX | B | iShares PHLX SOX Semiconductor Sector Index Fund | 11.38 | |
SOXQ | B | Invesco PHLX Semiconductor ETF | 11.23 | |
PSI | A | PowerShares Dynamic Semiconductors | 10.16 | |
SOXS | F | Direxion Daily Semiconductor Bear 3x Shares | 9.87 |
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- CMOS
Complementary metal–oxide–semiconductor (CMOS) is a technology for constructing integrated circuits. CMOS technology is used in microprocessors, microcontrollers, static RAM, and other digital logic circuits. CMOS technology is also used for several analog circuits such as image sensors (CMOS sensor), data converters, and highly integrated transceivers for many types of communication. Frank Wanlass patented CMOS in 1963 (US patent 3,356,858) while working for Fairchild Semiconductor.
CMOS is also sometimes referred to as complementary-symmetry metal–oxide–semiconductor (COS-MOS).
The words "complementary-symmetry" refer to the typical design style with CMOS using complementary and symmetrical pairs of p-type and n-type metal oxide semiconductor field effect transistors (MOSFETs) for logic functions.Two important characteristics of CMOS devices are high noise immunity and low static power consumption.
Since one transistor of the pair is always off, the series combination draws significant power only momentarily during switching between on and off states. Consequently, CMOS devices do not produce as much waste heat as other forms of logic, for example transistor–transistor logic (TTL) or N-type metal-oxide-semiconductor logic (NMOS) logic, which normally have some standing current even when not changing state. CMOS also allows a high density of logic functions on a chip. It was primarily for this reason that CMOS became the most used technology to be implemented in very-large-scale integration (VLSI) chips.
The phrase "metal–oxide–semiconductor" is a reference to the physical structure of certain field-effect transistors, having a metal gate electrode placed on top of an oxide insulator, which in turn is on top of a semiconductor material. Aluminium was once used but now the material is polysilicon. Other metal gates have made a comeback with the advent of high-κ dielectric materials in the CMOS process, as announced by IBM and Intel for the 45 nanometer node and smaller sizes.
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